Sputtering Targets

Sputtering targets deposit layers of thin films of various materials like molybdenum, titanium, tantalum, chromium, and other electronic materials and alloys using physical vapor deposition or PVD sputtering processes.  Sputtering targets are essential for the production of semiconductors, data storage (CD, DVD), and flat panel displays.  Sputtering backing plates are made from molybdenum, copper, and stainless steel.

Sputtering of thin film materials is accomplished in vacuum chambers or with inert gas and a high energy source requiring ultra pure refractory metals like tungsten and molybdenum.  Sylhan will machine refractory metal sputtering targets, including tantalum sputtering targets, to your tight tolerance specifications.

Contact us to find out more about our refractory metal products and machining as well as other refractory metal precision machined parts.  Whether you are looking for sputtering targets, ion implantation part assemblies, or components for your lighting, medical (such as PET scan components), or aerospace needs (such as fixed wing hevi-metal balance weights), Sylhan makes the commitment to provide you with defect free components, expert service in machining of your refractory metals, and assistance in evaluating your needs.